YES-G Series (Gentle Plasma Cleaning)
YES-G1000
YES-G500

YES-CV200 Series (Powerful Plasma Strip/Descum)
YES-CV200RF
YES-CV200RFS

Plasma cleaning systems are an effective way to gently remove small amounts of contaminants from a substrate surface, while plasma strip systems are used for removing tough layers of polyimide or photoresist. (Plasma strip systems have a “descum” function that can be selected at the switch of a button for gentler cleaning operations).

YES-TA Series
YES-8TA, YES-10TA (Image Reversal)
YES-310TA, YES-58TA (Dual Function – Vacuum Bake/Vapor Prime Image Reversal)

YES-1224
YES-ÉcoCoat

YES-450PB Series
YES 6-2P-CP (150 mm wafers)
YES 8-2P-CP (200 mm wafers)
YES 12-2P-CP (300 mm wafers)

YES ovens are designed to provide a controlled ramp curing process for temperatures up to 450ºC in an oxygen-free environment. In addition, YES ovens provide a cleaner process in a controlled environment, so you get higher yields. YES ovens offer a unique cooling package to reduce your process time and utilize laminar flow technology, so your wafers stay clean.

Applications:

These high-performance coaters are used in large volume production of LCD products, PV, OLED, Flexible Display and various Organic and Printed Electronics applications. This system offers a robust, production-ready platform that generates high yields (>95%) with minimal operating and maintenance costs. It is available for processing Gen2 through Gen8 substrate sizes and beyond. It is also available for Spinless Coating of up to 450mm Silicon wafers.

The SCANNING ACOUSTIC MICROSCOPY VUE400-P is for Semiconductor Device Integrity Assessment and Failure Analysis and incorporates the latest in transducer and signal processing.

The first TEM sample preparation system using the disruptive new AIM technology, delivering significantly reduced turnaround times and enhanced productivity. AIM , SELA's unique Adaptive Ion Milling technology, is superior to the traditional Focused Ion Beam technology (FIB). AIM (TM) can reduce sample widths to below 50 nanometers over a large area with high precision, artifact free (wedge-like) quality, and higher throughput.

A dedicated, automated, timesaving, and user-friendly system that enables a total solution for TEM/STEM and SEM sample preparation for both cross-section and plan view in a wide range of applications. Featuring a cryo-cooled dry saw process, the EM3 system prepares specimens of either crystalline or amorphous materials. The output sample is mounted onto a compatible stub that allows rework.

Features

The MC600i is an enhanced version of the award-winning MC600 Microcleaving System. In addition to all the features of the MC600, the MC600i offers increased accuracy, enables cleaving of smaller wafer segments and dies, and allows cleaving as close as 0.5mm to a sample edge.