Back to Top

Vous êtes ici

Chemical Vapor Deposition Systems


Chemical Vapor Deposition (CVD) is a process used in the semiconductor and biotechnology industries for the deposition of a thin film of various materials in order to achieve surface modification. CVD enables nano-precise surface tension control of your process.

Complete dehydration followed by CVD coating provides a superior silane/substrate bond that is stable after exposure to atmospheric moisture, extending the time available between process steps. Chemical usage for a vapor deposition process is typically less than 1% of the amount needed for wet application processes, significantly reducing waste and chemical costs.


  •  Surface modification to prevent or promote adhesion
  •   Photoresist adhesion for semiconductor wafers
  •   Silane/substrate adhesion for microarrays (DNA, gene, protein, antibody, tissue)
  •   MEMS/NEMS coating to reduce stiction (static friction)
  •   BioMEMS and biosensor coating to reduce "drift" in device performance
  •   Promote biocompatibility between natural and synthetic materials
  •   Copper capping
  •   Anti-corrosive coating



Nous vous informons que nous utilisons des cookies pour vous offrir une expérience agréable sur notre site Internet. Vous acceptez cela en cliquant ici sur "Accepter". Vous trouverez plus d'informations à ce sujet dans notre protection des données.