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Chemical Vapor Deposition Systems
Chemical Vapor Deposition (CVD) is a process used in the semiconductor and biotechnology industries for the deposition of a thin film of various materials in order to achieve surface modification. CVD enables nano-precise surface tension control of your process.
Complete dehydration followed by CVD coating provides a superior silane/substrate bond that is stable after exposure to atmospheric moisture, extending the time available between process steps. Chemical usage for a vapor deposition process is typically less than 1% of the amount needed for wet application processes, significantly reducing waste and chemical costs.
- Surface modification to prevent or promote adhesion
- Photoresist adhesion for semiconductor wafers
- Silane/substrate adhesion for microarrays (DNA, gene, protein, antibody, tissue)
- MEMS/NEMS coating to reduce stiction (static friction)
- BioMEMS and biosensor coating to reduce "drift" in device performance
- Promote biocompatibility between natural and synthetic materials
- Copper capping
- Anti-corrosive coating