Proteus switches monitor cooling flow and other liquids in industrial applications. The 100 series is purely a flow switch, while the 500 and 800 series include metering outputs.
Contact us for more details of the large Proteus Range.

Proteus quality
Proteus has an ISO-9001 certified quality system. Our flow switches, meters and sensors are backed by a five year warranty.

WAFERMAP is an award winning software package used to collect, edit, analyze and visualize measured physical parameters on semiconductor wafers. WAFERMAP can import data files from various metrology tools such as ellipsometers, thickness gauges and four point probes. The imported data can then be visualized or printed as line scans, contour plots, 2D or 3D plots or as a histogram.

YES-G Series (Gentle Plasma Cleaning)
YES-G1000
YES-G500

YES-CV200 Series (Powerful Plasma Strip/Descum)
YES-CV200RF
YES-CV200RFS

Plasma cleaning systems are an effective way to gently remove small amounts of contaminants from a substrate surface, while plasma strip systems are used for removing tough layers of polyimide or photoresist. (Plasma strip systems have a “descum” function that can be selected at the switch of a button for gentler cleaning operations).

YES-TA Series
YES-8TA, YES-10TA (Image Reversal)
YES-310TA, YES-58TA (Dual Function – Vacuum Bake/Vapor Prime Image Reversal)

YES-1224
YES-ÉcoCoat

YES-450PB Series
YES 6-2P-CP (150 mm wafers)
YES 8-2P-CP (200 mm wafers)
YES 12-2P-CP (300 mm wafers)

YES ovens are designed to provide a controlled ramp curing process for temperatures up to 450ºC in an oxygen-free environment. In addition, YES ovens provide a cleaner process in a controlled environment, so you get higher yields. YES ovens offer a unique cooling package to reduce your process time and utilize laminar flow technology, so your wafers stay clean.

Applications:

The first TEM sample preparation system using the disruptive new AIM technology, delivering significantly reduced turnaround times and enhanced productivity. AIM , SELA's unique Adaptive Ion Milling technology, is superior to the traditional Focused Ion Beam technology (FIB). AIM (TM) can reduce sample widths to below 50 nanometers over a large area with high precision, artifact free (wedge-like) quality, and higher throughput.

A dedicated, automated, timesaving, and user-friendly system that enables a total solution for TEM/STEM and SEM sample preparation for both cross-section and plan view in a wide range of applications. Featuring a cryo-cooled dry saw process, the EM3 system prepares specimens of either crystalline or amorphous materials. The output sample is mounted onto a compatible stub that allows rework.

Features