ULTRA TEC: ARC-lite Antireflective Coater
Antireflective backside coatings are NIR optimized with no baking
Read more about it here:
http://www.asminternational.org/web/edfas/news/-/journal_content/56/10180/23558008/NEWS
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ULTRA TEC: UPGRADED ULTRACOLLIMATOR
Laser-based illumination module offers up to four times tilt alignment accuracy
Read more about it here:
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OKOS announces opening of OKOS EU
OKOS Solutions, LLC, today announced that it is opening OKOS EU Sales Office in Budapest, Hungary. In partnership with Femtonics Limited, OKOS EU showcases latest technology in Ultrasonic NDT Scanning Systems and Scanning Acoustic Microscopes (SAM). OKOS looks forward to working closely with customers in Europe.
OKOS EUTűzoltó street 59. 3rd floorBudapest, H-1094, HungaryContact person: Tamas Zalayeu@okos.comphone: +36 70 222 3022+1 571 477 7910
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EPO-TEK® 353ND-T est maintenant certifié selon ISO 10993
Nous avons le plaisir de vous annoncer qu’un autre produit d’EPO-TEK® est maintenant certifié selon ISO 10993: Epo-Tek 353ND-T.
Epo-Tek 353ND-T est une version thixotrope (pâteux, forme stable) du produit Epo-Tek 353ND. Ce produit est souvent utilisé pour des collages exigeantes une résistance à haute-température.
Les classes ISO testés sont:
- 10993-5
- 10993-6
- 10993-10
- 10993-11
Si vous avez besoin plus des informations, n’hésitez pas de nous contacter.
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Electrical Products
Resistivity Standards
- 76.2 mm, 200 mm, or 300 mm silicon wafers
- Used with 4-Point Probes, Eddy Current Gauges
ITO Sheet Resistance Standards
- 125mm x 125mm x 0.7mm
- 90% In2O3:10% SnO2 plates
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Film Thickness Products
Silicon Dioxide Standards
- Uniform layer of silicon dioxide on silicon wafers
- Used with Ellipsometers, Reflectometers, Film Monitors
Silicon Nitride Standards
- Layer of Silicon Nitride (LPCVD) on silicon wafers
- Used with Ellipsometers, Reflectometers, Film Monitors
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Dimensional Products
NanoCD Standards
- 25, 45, 70 and 110 nm Line Width
- Used with SEMs and CD-AFMs
Nanolattice Standard (NLS)
The NanoLattice Module Standard (NLSM) is a CD SEM calibration standard which enables accurate sub 0.13 μm lithography. The NanoLattice has the 0.1 μm pitch required for sub 0.13 μm SEM magnification calibration and characterization of non-linearity across the field of view.
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Contamination Standards
Absolute Contamination Standards
- Substrate Deposited Polystyrene Latex Spheres
- For use with Scanning Surface Inspection Systems (SSIS)
Edge Contamination Standards
- Edges of Substrate Deposited Polystyrene Latex Spheres
- For use with Edge Contamination Detection Systems
Reticle Contamination Standards
- Spheres deposited on photomasks / test plates
- For use with reticle and pellicle inspection systems
Silica Contamination Standards
- Substrate Deposited highly spherical Silica Spheres
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Improved Standard Video Resolution & Additional Magnification Option Now Available for ASAP-1 IPS Live Machine-Vision Output
A Key Feature of our ASAP-1 IPS System has been the ALWAYS LIVE MACHINE VISION screen which enables the user to make REALTIME processing decisions. This feature is becoming more and more crucial with the move to ever thinner silicon, and the complexities of modern mechanical decapsulation.
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Multiple Customers Select JVS for Inline GaN/Si Process Control
MIGDAL HAEMEK, Israel, July 7, 2014
Jordan Valley Semiconductors Ltd., a leading supplier of X-ray based metrology tools for advanced semiconductor manufacturing lines, today announced that it has recently delivered and successfully commissioned its JVX7300L in-line X-ray metrology tool at multiple customers. The systems have been purchased for in-fab process development and automated production monitoring of GaN on Si wafers.
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