Resistivity Standards

• 76.2 mm, 200 mm, or 300 mm silicon wafers      
• Used with 4-Point Probes, Eddy Current Gauges

ITO Sheet Resistance Standards

• 125mm x 125mm x 0.7mm
• 90% In2O3:10% SnO2 plates

Silicon Dioxide Standards

• Uniform layer of silicon dioxide on silicon wafers
• Used with Ellipsometers, Reflectometers, Film Monitors

Silicon Nitride Standards

• Layer of Silicon Nitride (LPCVD) on silicon wafers
• Used with Ellipsometers, Reflectometers, Film Monitors

NanoCD Standards

• 25, 45, 70 and 110 nm Line Width
• Used with SEMs and CD-AFMs

Nanolattice Standard (NLS)

The NanoLattice Module Standard (NLSM) is a CD SEM calibration standard which enables accurate sub 0.13 μm lithography. The NanoLattice has the 0.1 μm pitch required for sub 0.13 μm SEM magnification calibration and characterization of non-linearity across the field of view.

Absolute Contamination Standards

• Substrate Deposited Polystyrene Latex Spheres
• For use with Scanning Surface Inspection Systems (SSIS)

Edge Contamination Standards

• Edges of Substrate Deposited Polystyrene Latex Spheres
• For use with Edge Contamination Detection Systems

Reticle Contamination Standards

• Spheres deposited on photomasks / test plates
• For use with reticle and pellicle inspection systems

Silica Contamination Standards

• Substrate Deposited highly spherical Silica Spheres