The MX2012 is an automatic wafer geometry gauge to measure stress on 300 mm Si-wafers during Production. E+H’s technology using congtactless capacitive sensors is applied.
Throughput is 60 wafers/ hour
The MX2118 is a fully automated wafer geometry gauge.
A combination of two gauges offers the measurement of thickness, flatness, bow and warp
for 450 and 300 mm Si-Wafer
The MX203 is a manual loaded wafer geomtery gauge.
It measures the thickness, bow and warp of silicon wafer.
Stress option is available as well.
The YES-VertaCure automated, high temperature cure series of ovens is designed for today’s most demanding MEMS and semiconductor process applications. Whether it’s for proper curing of multiple layers of polyimide in an RDL (Bond Pad Re-routing) application or annealing copper in an advanced semiconductor device, the YES-VertaCure helps achieve total environmental control to increase yields and extend device performance.
Flow Switch, Flow Meter, Welding "Water Saver"
Proteus can provide flow switches, flow meters, or flow sensors to protect your critical cooling equipment for water cooled equipment within semiconductor, and Industrial and medical cooling systems.
Proteus switches monitor cooling flow and other liquids in industrial applications. The 100 series is purely a flow switch, while the 500 and 800 series include metering outputs.
Contact us for more details of the large Proteus Range.
Proteus quality
Proteus has an ISO-9001 certified quality system. Our flow switches, meters and sensors are backed by a five year warranty.
WAFERMAP is an award winning software package used to collect, edit, analyze and visualize measured physical parameters on semiconductor wafers. WAFERMAP can import data files from various metrology tools such as ellipsometers, thickness gauges and four point probes. The imported data can then be visualized or printed as line scans, contour plots, 2D or 3D plots or as a histogram.
YES-G Series (Gentle Plasma Cleaning)
YES-G1000
YES-G500
YES-CV200 Series (Powerful Plasma Strip/Descum)
YES-CV200RF
YES-CV200RFS
Plasma cleaning systems are an effective way to gently remove small amounts of contaminants from a substrate surface, while plasma strip systems are used for removing tough layers of polyimide or photoresist. (Plasma strip systems have a “descum” function that can be selected at the switch of a button for gentler cleaning operations).